FIB

DeepFIB

Unleash the power: Redefying limits of the gallium focused beam

DeepFIB is our very last Ga FIB column released. DeepFIB extends the panel of applications thanks to both an optimized design for low energy work and a sharply focused beam even for high currents.

DeepFIB column allows to reach the smallest resolution at high acceleration voltage (< 2.5nm) and at low energy (<400 nm @500 eV) and to keep an ultra-fine resolution in a wide range of possible currents. The high current mode increased up to135 nA enables a faster milling and a huge time saving keeping the sharpest beam.

i-FIB+

50 times faster than
the most powerful Ga FIB
With i-FIB+, save an hour every minute

i-FIB⁺ column is the perfect answer for today’s low machining time growing demands. With the patented compact no cooling ECR source technology, i-FIB⁺ achieves a sputtering rate up to 50 times higher than the most powerful Ga FIB keeping sharp current distribution. These assets are well adapted for sub-100 nm thickness samples preparation required for high-quality TEM images. Not only has i-FIB⁺ the great asset to get rid of gallium primary ions thanks to the use of non-contaminant noble gas ions non-contaminant for microelectronic processes, but also it is able to deliver probe current up to 3 µA making the milling of large structure much more time effective. The column allows the preparation of large-area cross-sections, as large as 1mm wide at 30 keV, that is unmatched in the market.

Orage

Extended performances with our new Ga FIB column

Orage is our very last Ga FIB column released. While keeping the well-proven performances of Cobra, Orage extends the panel of applications thanks to both an optimized design for low energy work and a sharply focused beam even for high currents. The addition of a piezo-controlled motor source gives an excellent FIB characteristic reproducibility and ease-of-use regardless of energy or current applied.

Cobra

The well-recognized Ga FIB column

With an ultimate beam resolution of 2.5 nm, Cobra is the finest Gallium column. Cobra is designed to keep an extremely well-defined beam shape at different current modes. This well-approved FIB column allows both unique milling performances and imaging capabilities. Cobra FIB column is serially set up on mostly FIB-SEM instruments even for UHV atmospheres.

Cobra ExB

High resolution Ga-free FIB column

Cobra ExB is a specific FIB column providing a performing alternative to the well-known Cobra FIB (gallium source). Thanks to the alliance of a LMAIS (Liquid Metal Alloy Ion Source) and a Wien Filter, Cobra ExB offers an easy solution for ion mass selection from light species to heavy clusters with great resolution imaging. This Ga-free FIB Column achieves precise milling and accurate selective surface implantation with a large panel of ion species.

Chroma ExB

Pentode objective for ultimate
performances in Ga-free environment

Chroma ExB FIB column introduces an all-new objective design called “pentode” for optimizing both low and high current modes in one single device. The association of a LMAIS and a Wien Filter reaches accurate ion mass selection from light species to heavy clusters keeping extreme resolution imaging due to the pentode objective. This Ga-free primary beam achieves especially precise milling, low energy range working and selective implantation with a very large panel of ion species.

Taipan

Unique correlative Optical / FIB column

Featuring patented coaxial technology, Taipan column achieves simultaneously optical and FIB images offering a wide range of applications such as circuit edit (CE), biology, biotechnology and ion beam lithography. Nondestructive photon imaging coupled with high resolution ion milling give the opportunity to reach new specifications for advanced 3D reconstruction and retro-engineering processes.

Its innovative compact objective lens design allows to obtain the smallest spot size keeping an excellent photon resolution. Taipan could be also available in a correlative electron / photon column configuration.