
MonoGIS
Single Gas Injection System
1 |
Ultra-High Vacuum compatible |
2 |
Its compactness |
3 |
Conductive or insulating deposition using FIBID or FEBID techniques (Focused Electron/Ion Beam Induced Depositions) |
4 |
Increased FIB etching rate with an expected quality, accuracy and repeatability using chemistry coupled to ion or electron sputtering |
5 |
Controlled injected gas flow by an accurate temperature regulator |
6 |
No possible chemical contact with precursors for user’s safety |
7 |
A Direct Injection Module (DIM) can be mount to inject a large choice of gaseous precursors |




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MonoGIS nozzle approaching the sample surface
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Circuit delayering realized with Tescan XEIA3 (i-FIB + MonoGIS) / FOV = 20 µm
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Platinum deposition using MonoGIS on TESCAN FERA3 (i-FIB) / FOV = 400 µm
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SiOx array fabrication with MonoGIS