Standalone Systems

QuiiN

Precise multi - ion Implantation for discovering full spectrum of New Materials Possibilities

ORSAY PHYSICS QuiiN (Quantum Ion Implanter at Nanoscale) is a versatile ion beam system designed for implantation applications. This last generation of platforms is crucial for the next phase of quantum computing revolution, which requires precisely placed ions within material structures.

QuiiN combines an electrostatic SEM for region localization and one of our two new FIB columns designed for implantation. The Veloce column allows the implantation of specific isotopes of gold, germanium, or silicon using a Wien filter. The iVeloce column, also equipped with a Wien filter, enables the use of various gases such as nitrogen, argon, oxygen, helium, xenon, or gas mixtures like CO2. Both columns feature a new beam current meter for precise dose implantation.

Additionally, QuiiN includes an in-situ heating stage, FurnaSEM 1000, which quickly heats the sample to over 950°C and maintains this temperature, enabling in-situ annealing during irradiation. The in-chamber SE detector is optimized for high-quality imaging, allowing observation of sensitive samples without damage, even at low current.

Powered by ORSAY PHYSICS Pegasus, a modular and customizable graphical user interface, QuiiN enables users to design their own implantation experiments. Pegasus offers unique milling strategies based on points, reducing beam impact and improving milling or deposition effectiveness. All control parameters are integrated into the API, allowing users to script or integrate any part of the machine.

 

Vacuum Performances
Main Chamber Vaccum	< 9x10-3 Pa
Sample Main Chamber Introduction	< 5 min

 

1	Fine-tune and create new materials surface characteristics by unprecedented milling precision and Isotope Selection seamlessly using the Wien filter in our ion implantation tool.
2	Activitate dopants, repair unwanted lattice damage and immediately enhance materials properties by In-situ annealing capabilities.
3	Ensuring a seamless transition in your experimental setups and maximize your research efficiency with switching between specie (N, Ar, O, He, Xe or gas mixtures) or (Au, Ge, Si), all from the same source.
4	Ensure your resultats are free from photoluminescence artifacts, implantation irregularities and surface damage by excellent dose controlling in the system and removal of the neutral charge.
5	Visualize and acquire clearer and more accurate resultats, by leveraging the advanced detection capabilities of YAP scientillators.
6	Fine control of the acceleration voltage with a range of energy from 5 keV to 30 keV.
7	Adjust precisely the dose prior to d by the sample prior to implantation using a new current measurement system.
8	Locate the area of interest and avoid the ion implantation with a SEM in coincidence point with the FIB column.
9	Your own experiments and analytical routines by utilizing advantages of ORSAY PHYSICS’s open hardware and software.

 

 

 

 

 

UHV FIB-SEM NanoSpace

For ultimate performances
at Ultra-High Vacuum

NanoSpace is a conveniently versatile system specially designed to operate under Ultra-High Vacuum (UHV) conditions. NanoSpace can be configured either as a Scanning Electron Microscope (SEM) or as a dual beam platform combining a SEM and a high performance Focused Ion Beam (FIB). This UHV instrument is developed with a modular architecture allowing a large choice of SEM and FIB columns that matches end-users specific needs and goals. NanoSpace offers the best, complete and customized solution for FIB nanomachining, surface analysis, on samples demanding the most rigorous contamination-free environment.

NanoSpace can also be equipped with a UHV compatible Gas Injection System (GIS) for local metal deposition and selective etching.

In-situ connection to third party systems such as MBE clusters, surface analysis instrument, is also possible through a UHV intermediate chamber. This connectivity broadens NanoSpace application scope.

 

Vacuum Performances
Main Chamber Vacuum	5.10-10 mbar
UHV Configuration	Maximum instrument bakeout   temperature is 120°C
Sample Main Chamber Introduction	30 min

 

 

1	Full UHV design - Contamination free environment NanoSpace is the first UHV designed FIB-SEM instrument, fully bakeable to reach ultimate vacuum level.
2	Fully customizable system UHV NanoSpace can be customized in order to completely fulfill specific needs. Total flexibility is given in selecting the FIB column, either with LMAIS, gas plasma ion source, Wien Filtered Liquid Metal Alloy Ion Source (LMAIS), or Wien filtered gas plasma ion source.
3	Designed to perform high quality surface analysis Excellent conditions and unique dual beam geometry allow correlation of in-situ SEM and high quality Secondary Ion Mass Spectrometry images in a single instrument.
4	Accurate sample control The 6-axis stage UHV compatible allows for loading samples which dimensions up to 100 mm in length and width.
5	UHV connection A UHV intermediate chamber is designed to ensure Nanospace’s connection to third party UHV instruments, process cluster or synchrotron beam line.
6	Fully automated instrument The NanoSpace control and imaging software is highly ergonomic and easy to use. Control of the vaccum system is fully automated to ensure safe, fast and easy vacuum operations.
7	High resolution imaging UHV connection NanoSpace is equipped with two different high-resolution electron beam columns, either fully electrostatic or electromagnetic. In combination with the Secondary Electron Detector, Nanospace produces high quality images.