UHV FIB-SEM NanoSpace
For ultimate performances
at Ultra-High Vacuum
NanoSpace is a conveniently versatile system specially designed to operate under Ultra-High Vacuum (UHV) conditions. NanoSpace can be configured either as a Scanning Electron Microscope (SEM) or as a dual beam platform combining a SEM and a high performance Focused Ion Beam (FIB). This UHV instrument is developed with a modular architecture allowing a large choice of SEM and FIB columns that matches end-users specific needs and goals. NanoSpace offers the best, complete and customized solution for FIB nanomachining, surface analysis, on samples demanding the most rigorous contamination-free environment.
NanoSpace can also be equipped with a UHV compatible Gas Injection System (GIS) for local metal deposition and selective etching.
In-situ connection to third party systems such as MBE clusters, surface analysis instrument, is also possible through a UHV intermediate chamber. This connectivity broadens NanoSpace application scope.
Vacuum Performances |
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Main Chamber Vacuum |
5.10-10 mbar |
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UHV Configuration |
Maximum instrument bakeout |
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Sample Main Chamber Introduction |
30 min |
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Full UHV design - Contamination free environment |
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Fully customizable system |
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Designed to perform high quality surface analysis Excellent conditions and unique dual beam geometry allow correlation of in-situ SEM and high quality Secondary Ion Mass Spectrometry images in a single instrument. |
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Accurate sample control The 6-axis stage UHV compatible allows for loading samples which dimensions up to 100 mm in length and width. |
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UHV connection |
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Fully automated instrument The NanoSpace control and imaging software is highly ergonomic and easy to use. Control of the vaccum system is fully automated to ensure safe, fast and easy vacuum operations. |
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High resolution imaging UHV connection |
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Inside NanoSpace UHV chamber