e-CLIPSE

UHV Focused Electron Beam
dedicated to surface analysis applications

This fully electrostatic electron column, designed to reach sub-8 nm spot size, is equipped with a Schottky emitter.

The current dynamics (pA to more than 150 nA) is suited for both local imaging and surface analysis techniques involving low and medium energy electrons (up to 30keV).
The mechanical and optical design ensures the maximum compactness of the column.
The dimensions and shape of e-CLIPSE objective lens is appropriated to short working distance imaging and offers the optimised configuration with other analysis equipments.

e-CLIPSE is available for R&D laboratories as well as for equipment manufacturers, and is easily adaptable on standard vacuum chambers. The design of the column can be customised according to your needs and the geometry of your existing tool.
 

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