e-CLIPSE

e-CLIPSE, a focused electron beam column, is dedicated both for local imaging and surface analysis techniques involving low and medium energy electrons (up to 30keV).

This fully electrostatic electron column, designed to reach sub-8 nm spot size, is equipped with a Schottky emitter.

The mechanical and optical design ensures the maximum compactness of the column.
The dimensions and shape of e-CLIPSE lens are designed for short working distance imaging, which is often required when configured with other analysis equipments.

e-CLIPSE is available for R&D laboratories as well as for UHV equipment manufacturers, and is easily adaptable on standard UHV chambers. The design of the column can be customised according to your needs and the geometry of your existing tool.